I tried that, didn't work. Now tried it with multiple icons, thinking it might have been the application forcing it, but same result for all that I've tried. And I'm also wondering how would I get it back after?
There were years of hope in the semiconductor industry that somebody would come up with something better rather than having to make that nightmare work.
Alternatives were tried. Synchrotron EUV sources. (works, but huge).
Linear accelerators (The SLAC beamline was used as a light source as a test). X-ray lasers (don't work yet). Electron beam lithography (works, but too slow.)
Whatever happened to Multibeam? [1] They claim to sell a multiple electron beam writer for maskless chip making. They, and their predecessor company, have been at this since 1980. Not much new on the web site, and their last press release was in 2020.
Intel is getting the first prototype(s), in a few years from now. Then add a a year or two before those EXE’s are actually used for volume manufacturing.
No exclusivity, as it’s ASML business model to work fairly with all semiconductor manufacturers.
They have the prototypes now, and are talking about entering mass production 2H 2024 [1]. From what I read, Intel has already received and taped out 18A and 20A using these new high-NA machines [2]
>Intel has announced that manufacturing of 18A-node chips will commence in H2 2024, six months ahead of schedule. According to a roadmap released last year, this node will be Intel’s first to employ high-NA lithography. It’s not clear whether this means that the next-gen EUV technology makes its debut in production a little earlier than expected. Last January, ASML CEO Peter Wennink told investors that he expected high-volume high-NA manufacturing to start in 2025 or 2026.
ASML high NA
Credit: ASML
ASML’s first high-NA system, the Twinscan EXE:5000, is fully production-capable, but chip manufacturers will initially use it for process development. The first unit will ship in H1 2023, with Intel on the receiving end. The US processor maker also placed the first order for the EXE:5000’s successor, the EXE:5200. The swift adoption of high-NA is an important element in Intel’s strategy to regain “unquestioned leadership” in the semiconductor industry by 2025.
